This section is dedicated to showcase some of the most important technologies that OCRICOM deals with in thin film deposition and characterization. This landing page lists some relevant technologies and the sub-sections (Deposition Methods) present more in-depth description of our capabilities.
Physical Vapor Deposition (PVD) Methods
- Ion Beam Sputtering (IBS)
- Magnetron Sputtering (MS)
- Electron Beam Evaporation (EBE)
- Thermal Evaporation
Chemical Vapor Deposition (CVD) Methods
- Plasma Enhanced Chemical Vapor Deposition (PECVD)
- Atomic Layer Deposition (ALD)
- Diamond Like Carbon Coating (DLC)
Thin Film Characterization Methods
- Spectrophotometry
- Ellipsometry
- Optical Microscopy
- Atomic Force Microscopy (AFM)
- Scanning Electron Microscopy (SEM)